unique" code. It was using DBEraseLabelsByContent() which would
erase all matching labels, and could potentially erase labels that
were still remaining on the list being processed, causing a segfault.
Also corrected minor errors identified by valgrind during debugging
the above-referenced problem.
Instead of a 6-character suffix generated randomly, the 6-character
suffix is generated by a hash algorithm from the device parameters.
If the cell parameters are changed, then the cell itself changes.
If the instance name was default (derived from the cell name) then
the instance name changes accordingly. The result is that there
cannot be two (auto-)generated cells with the same parameters but
with different cell names.
such that it looks for material connecting to the label at the
center point of the label and not the lower left corner. This keeps
the behavior of looking for tiles on the corners of a degenerate
label line or point between layers, but avoids problems with sticky
labels that are not quite aligned with the rectangle (due to certain
commercial EDA tools that have a sloppier notion of labeling).
p device; this was previously dependent only on the first character
of the extracted device model name. Since the tech file has control
over what the device layer names are but not the extracted model
names, the device layer type name is used as a backup way to determine
if the type is n or p, if that cannot be determined from the extracted
model name.
of an alias that defines only one type (which is treated like it
would be if it were declared on the same line as the original type
declaration), such that the alias name does not become the default
name for the layer (which is the one that ends up showing in the
title bar when hovering over the layer toolbar icon). Mainly the
problem showed up as "nwell" for the sky130A process appearing in the
toolbar as "allwellplane".
which was failing to clear tiles in the layout of the "processed" state,
leading to unpredicatable results if the same layout layer is used in
a subsequent CIF operation.
with two or more terminals other than the device identifier type
tied together) would fail if there were not a device record
specifically matching a one-S/D-terminal device. This is
inconsistent with past behavior, and so has been fixed.
The new CIF operator BRIDGE-LIM is similar to the BRIDGE operator with the difference that the material created to meet the minimum spacing/width rules do not overlap the limiting layers. Syntax of the new operator is:
bridge-lim spacing width layers
where "layers" are the limiting layers.
from child cells, which was incorrectly descending all the way down
into the hierarchy; not only can this produce the incorrect result
but it also wastes time searching cells that don't need to be
searched.
are interpreted in the dimensions used in the cifoutput section rather
than always in centimicrons (otherwise, rules at, say, 5nm cannot be
represented in the DRC section).
the bottom in non-interacting areas means that any change in DRC
to a subcell must be handled before checking DRC in the parent.
Previously the order of checks was reversed, moving parent cells
to the beginning of the check list. This prevents the error cited
in the previous commit which was showing up as a delayed DRC check
when creating parameterized cells.
processes "interaction areas". This should eliminate weirdnesses
where errors will fail to show up in a subcell that does not
interact with paint or other subcells in the top level edit cell.
These errors cannot be reported directly in the top level cell,
but a new error message has been created to direct the user to
check the subcell for errors. Also: Modified the toolkit procedures
to force DRC to be run on newly created or modified parameterized
cell layouts. There is some oddity about the process that causes
DRC errors to be delayed unless a print statement is put before the
DRC check; I would like to investigate this further.
the rule is a normal database rule or a CIF-DRC rule. For the latter,
the flag is used when substituting for escape strings in the "why"
rule explanation to produce the correct value in microns.
read". While "lef read" normally annotates existing layout, this
option ensures that no additional cells are created from macros in
the input LEF file. (2) Added a check on the "Input off lambda grid"
warning during CIF/GDS input such that it is not repeated once issued,
as it tends to be output many times when it occurs.
from the layout window. The main reason for this is to keep the
box out of the image when doing "plot svg". The "plot" command was
also modified to always do a plot of the entire cell in the active
layout window if the box is not present.
are considered an exception to the "-toplayer" restriction; this is
because masterslice well/substrate layers will affect the electrical
connectivity between port and sustrate or well.
bounding box of the selection (somewhat unuseful, especially as the
result gets absorbed by the tag callback), and "box select", which
sets the cursor box to the bounding box of the selection (much more
useful). Also corrected the "port" command so that the command
"port make" will search only for non-port labels.
command when annotating an existing layout from a LEF database, if
there is a port in the layout that is shadowed by a label with the
same name that is not a port.
because the opposite type (pwell) is not directly underneath the
gate, but touches it on the plane below. Because the pwell may
be represented by space tiles on the well plane, it was also
necessary to deal with the space type in the bitmask.
type in the device record, which was not updated at the end of
checking terminals for matching device extraction types. so the
boundary survey might see the wrong device type and generate an
incorrect boundary survey as a result.
errors in the periphery of where a change has been made. For some
reason this was not apparent before, but seems to be from a change
dating back to 2008---which seems unlikely. The fact that it has
not been seen before may have something to do with the size of the
DRC halo compared to the DRC step size in the SkyWater PDK, where
it has suddenly become apparent. Jury is still out on this one.
that produces a result that looks like "lef write -hide" in the middle
but "lef write" around the edge. Can be useful for catching all the
detail around the edges but obscuring/simplifying the bulk of the cell
interior.
Dan Moore
Dan Moore
Tim Edwards
fabian-l-c