mirror of https://github.com/VLSIDA/OpenRAM.git
Standardize contact names.
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8e151553e4
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aceaa9fb21
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@ -213,7 +213,7 @@ class pbitcell(bitcell_base.bitcell_base):
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# y-offset for the access transistor's gate contact
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self.gate_contact_yoffset = max_contact_extension + self.m2_space \
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+ 0.5 * max(contact.poly.height, contact.m1m2.height)
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+ 0.5 * max(contact.polym1.height, contact.m1m2.height)
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# y-position of access transistors
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self.port_ypos = self.m1_space + 0.5 * contact.m1m2.height + self.gate_contact_yoffset
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@ -234,7 +234,7 @@ class pbitcell(bitcell_base.bitcell_base):
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self.read_port_spacing = self.bitline_offset + self.m2_space
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# spacing between cross coupled inverters
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self.inverter_to_inverter_spacing = contact.poly.width + self.m1_space
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self.inverter_to_inverter_spacing = contact.polym1.width + self.m1_space
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# calculations related to inverter connections
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inverter_pmos_contact_extension = 0.5 * \
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@ -243,19 +243,19 @@ class pbitcell(bitcell_base.bitcell_base):
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(self.inverter_nmos.active_contact.height - self.inverter_nmos.active_height)
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self.inverter_gap = max(self.poly_to_active,
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self.m1_space + inverter_nmos_contact_extension) \
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+ self.poly_to_contact + 2 * contact.poly.width \
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+ self.poly_to_contact + 2 * contact.polym1.width \
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+ self.m1_space + inverter_pmos_contact_extension
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self.cross_couple_lower_ypos = self.inverter_nmos_ypos \
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+ self.inverter_nmos.active_height \
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+ max(self.poly_to_active,
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self.m1_space + inverter_nmos_contact_extension) \
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+ 0.5 * contact.poly.width
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+ 0.5 * contact.polym1.width
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self.cross_couple_upper_ypos = self.inverter_nmos_ypos \
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+ self.inverter_nmos.active_height \
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+ max(self.poly_to_active,
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self.m1_space + inverter_nmos_contact_extension) \
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+ self.poly_to_contact \
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+ 1.5 * contact.poly.width
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+ 1.5 * contact.polym1.width
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# spacing between wordlines (and gnd)
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self.m1_offset = -0.5 * self.m1_width
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@ -263,7 +263,7 @@ class pbitcell(bitcell_base.bitcell_base):
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# spacing for vdd
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implant_constraint = max(inverter_pmos_contact_extension, 0) \
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+ 2 * self.implant_enclose_active \
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+ 0.5 * (contact.well.width - self.m1_width)
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+ 0.5 * (contact.activem1.width - self.m1_width)
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metal1_constraint = max(inverter_pmos_contact_extension, 0) + self.m1_space
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self.vdd_offset = max(implant_constraint, metal1_constraint) + 0.5*self.m1_width
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@ -367,16 +367,16 @@ class pbitcell(bitcell_base.bitcell_base):
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self.add_path("m1",
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[self.inverter_nmos_left.get_pin("D").uc(),
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self.inverter_pmos_left.get_pin("D").bc()],
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width=contact.active.second_layer_width)
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width=contact.activem1.second_layer_width)
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self.add_path("m1",
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[self.inverter_nmos_right.get_pin("S").uc(),
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self.inverter_pmos_right.get_pin("S").bc()],
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width=contact.active.second_layer_width)
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width=contact.activem1.second_layer_width)
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# add contacts to connect gate poly to drain/source
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# metal1 (to connect Q to Q_bar)
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contact_offset_left = vector(self.inverter_nmos_left.get_pin("D").rc().x \
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+ 0.5 * contact.poly.height,
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+ 0.5 * contact.polym1.height,
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self.cross_couple_upper_ypos)
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self.add_via_center(layers=self.poly_stack,
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offset=contact_offset_left,
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@ -384,7 +384,7 @@ class pbitcell(bitcell_base.bitcell_base):
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contact_offset_right = vector(self.inverter_nmos_right.get_pin("S").lc().x \
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- 0.5*contact.poly.height,
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- 0.5*contact.polym1.height,
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self.cross_couple_lower_ypos)
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self.add_via_center(layers=self.poly_stack,
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offset=contact_offset_right,
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@ -926,14 +926,14 @@ class pbitcell(bitcell_base.bitcell_base):
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"""
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# add poly to metal1 contacts for gates of the inverters
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left_storage_contact = vector(self.inverter_nmos_left.get_pin("G").lc().x \
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- self.poly_to_contact - 0.5*contact.poly.width,
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- self.poly_to_contact - 0.5*contact.polym1.width,
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self.cross_couple_upper_ypos)
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self.add_via_center(layers=self.poly_stack,
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offset=left_storage_contact,
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directions=("H", "H"))
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right_storage_contact = vector(self.inverter_nmos_right.get_pin("G").rc().x \
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+ self.poly_to_contact + 0.5*contact.poly.width,
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+ self.poly_to_contact + 0.5*contact.polym1.width,
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self.cross_couple_upper_ypos)
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self.add_via_center(layers=self.poly_stack,
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offset=right_storage_contact,
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@ -88,14 +88,14 @@ class pgate(design.design):
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# Center is completely symmetric.
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if rotate:
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contact_width = contact.poly.height
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contact_m1_width = contact.poly.second_layer_height
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contact_m1_height = contact.poly.second_layer_width
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contact_width = contact.polym1.height
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contact_m1_width = contact.polym1.second_layer_height
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contact_m1_height = contact.polym1.second_layer_width
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directions = ("H", "V")
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else:
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contact_width = contact.poly.width
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contact_m1_width = contact.poly.second_layer_width
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contact_m1_height = contact.poly.second_layer_height
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contact_width = contact.polym1.width
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contact_m1_width = contact.polym1.second_layer_width
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contact_m1_height = contact.polym1.second_layer_height
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directions = ("V", "H")
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if position == "center":
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@ -103,7 +103,7 @@ class pgate(design.design):
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+ vector(0.5 * self.poly_width, 0)
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elif position == "farleft":
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contact_offset = left_gate_offset \
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- vector(0.5 * contact.poly.width, 0)
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- vector(0.5 * contact.polym1.width, 0)
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elif position == "left":
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contact_offset = left_gate_offset \
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- vector(0.5 * contact_width - 0.5 * self.poly_width, 0)
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@ -131,7 +131,7 @@ class pgate(design.design):
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+ left_gate_offset.scale(0.5, 0)
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self.add_rect_center(layer="poly",
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offset=mid_point,
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height=contact.poly.first_layer_width,
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height=contact.polym1.first_layer_width,
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width=left_gate_offset.x - contact_offset.x)
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def extend_wells(self, middle_position):
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@ -95,8 +95,8 @@ class pinv(pgate.pgate):
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tx_type="pmos")
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tx_height = nmos.poly_height + pmos.poly_height
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# rotated m1 pitch or poly to active spacing
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min_channel = max(contact.poly.width + self.m1_space,
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contact.poly.width + 2 * self.poly_to_active)
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min_channel = max(contact.polym1.width + self.m1_space,
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contact.polym1.width + 2 * self.poly_to_active)
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# This is the extra space needed to ensure DRC rules
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# to the active contacts
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@ -85,7 +85,7 @@ class pnand2(pgate.pgate):
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""" Pre-compute some handy layout parameters. """
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# metal spacing to allow contacts on any layer
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self.input_spacing = max(self.poly_space + contact.poly.first_layer_width,
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self.input_spacing = max(self.poly_space + contact.polym1.first_layer_width,
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self.m1_space + contact.m1m2.first_layer_width,
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self.m2_space + contact.m2m3.first_layer_width,
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self.m3_space + contact.m2m3.second_layer_width)
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@ -98,7 +98,7 @@ class pnand2(pgate.pgate):
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# Two PMOS devices and a well contact. Separation between each.
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# Enclosure space on the sides.
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self.well_width = 2 * self.pmos.active_width + contact.active.width \
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self.well_width = 2 * self.pmos.active_width + contact.activem1.width \
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+ 2 * self.active_space \
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+ 2 * self.well_enclose_active
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@ -202,10 +202,10 @@ class pnand3(pgate.pgate):
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# wire space or wire and one contact space
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metal_spacing = max(self.m1_space + self.m1_width,
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self.m2_space + self.m2_width,
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self.m1_space + 0.5 *contact.poly.width + 0.5 * self.m1_width)
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self.m1_space + 0.5 *contact.polym1.width + 0.5 * self.m1_width)
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active_spacing = max(self.m1_space,
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0.5 * contact.poly.first_layer_width + self.poly_to_active)
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0.5 * contact.polym1.first_layer_width + self.poly_to_active)
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inputC_yoffset = self.nmos3_pos.y + self.nmos.active_height + active_spacing
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self.route_input_gate(self.pmos3_inst,
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self.nmos3_inst,
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@ -84,7 +84,7 @@ class pnor2(pgate.pgate):
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""" Pre-compute some handy layout parameters. """
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# metal spacing to allow contacts on any layer
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self.input_spacing = max(self.poly_space + contact.poly.first_layer_width,
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self.input_spacing = max(self.poly_space + contact.polym1.first_layer_width,
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self.m1_space + contact.m1m2.first_layer_width,
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self.m2_space + contact.m2m3.first_layer_width,
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self.m3_space + contact.m2m3.second_layer_width)
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@ -121,7 +121,7 @@ class precharge(design.design):
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self.lower_pmos_inst.place(self.lower_pmos_position)
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# adds the upper pmos(s) to layout
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ydiff = self.pmos.height + 2 * self.m1_space + contact.poly.width
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ydiff = self.pmos.height + 2 * self.m1_space + contact.polym1.width
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self.upper_pmos1_pos = self.lower_pmos_position + vector(0, ydiff)
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self.upper_pmos1_inst.place(self.upper_pmos1_pos)
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@ -175,7 +175,7 @@ class precharge(design.design):
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# adds the contact from active to metal1
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well_contact_pos = self.upper_pmos1_inst.get_pin("D").center().scale(1, 0) \
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+ vector(0, self.upper_pmos1_inst.uy() + contact.well.height / 2 \
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+ vector(0, self.upper_pmos1_inst.uy() + contact.activem1.height / 2 \
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+ self.well_extend_active)
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self.add_via_center(layers=self.active_stack,
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offset=well_contact_pos,
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@ -183,7 +183,7 @@ class precharge(design.design):
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well_type="n")
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# leave an extra pitch for the height
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self.height = well_contact_pos.y + contact.well.height + self.m1_pitch
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self.height = well_contact_pos.y + contact.activem1.height + self.m1_pitch
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# nwell should span the whole design since it is pmos only
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self.add_rect(layer="nwell",
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@ -80,7 +80,7 @@ class ptristate_inv(pgate.pgate):
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# Height is an input parameter, so it is not recomputed.
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# Make sure we can put a well above and below
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self.top_bottom_space = max(contact.well.width, contact.well.height)
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self.top_bottom_space = max(contact.activem1.width, contact.activem1.height)
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def add_ptx(self):
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@ -138,8 +138,8 @@ class ptristate_inv(pgate.pgate):
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"""
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pmos_yoff = self.height - self.pmos.active_height \
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- self.top_bottom_space - 0.5 * contact.well.height
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nmos_yoff = self.top_bottom_space + 0.5 * contact.well.height
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- self.top_bottom_space - 0.5 * contact.activem1.height
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nmos_yoff = self.top_bottom_space + 0.5 * contact.activem1.height
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# Tristate transistors
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pmos1_pos = vector(self.pmos.active_offset.x, pmos_yoff)
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