mirror of https://github.com/VLSIDA/OpenRAM.git
Update pgate well and well contacts.
Extend well left and right past a cell boundary. Use asymmetric well contacts.
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@ -134,10 +134,10 @@ class pgate(design.design):
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# Add a rail width to extend the well to the top of the rail
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nwell_max_offset = max(self.find_highest_layer_coords("nwell").y,
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self.height + 0.5 * self.m1_width)
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nwell_position = middle_position
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nwell_position = middle_position - vector(self.well_extend_active, 0)
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nwell_height = nwell_max_offset - middle_position.y
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self.add_rect(layer="nwell",
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offset=middle_position,
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offset=nwell_position,
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width=self.well_width,
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height=nwell_height)
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if "vtg" in layer:
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@ -150,7 +150,7 @@ class pgate(design.design):
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if "pwell" in layer:
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pwell_min_offset = min(self.find_lowest_layer_coords("pwell").y,
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-0.5 * self.m1_width)
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pwell_position = vector(0, pwell_min_offset)
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pwell_position = vector(-self.well_extend_active, pwell_min_offset)
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pwell_height = middle_position.y - pwell_position.y
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self.add_rect(layer="pwell",
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offset=pwell_position,
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@ -183,7 +183,6 @@ class pgate(design.design):
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0.5 * pmos.active_contact.first_layer_height)
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self.nwell_contact = self.add_via_center(layers=layer_stack,
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offset=contact_offset,
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directions=("H", "V"),
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implant_type="n",
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well_type="n")
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self.add_rect_center(layer="m1",
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@ -237,7 +236,6 @@ class pgate(design.design):
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0.5 * nmos.active_contact.first_layer_height)
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self.pwell_contact= self.add_via_center(layers=layer_stack,
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offset=contact_offset,
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directions=("H", "V"),
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implant_type="p",
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well_type="p")
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self.add_rect_center(layer="m1",
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@ -52,10 +52,10 @@ class pinv(pgate.pgate):
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def create_layout(self):
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""" Calls all functions related to the generation of the layout """
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self.setup_layout_constants()
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self.route_supply_rails()
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self.place_ptx()
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self.add_well_contacts()
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self.extend_wells(self.well_pos)
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self.route_supply_rails()
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self.connect_rails()
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self.route_input_gate(self.pmos_inst,
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self.nmos_inst,
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@ -104,8 +104,9 @@ class pinv(pgate.pgate):
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extra_contact_space = max(-nmos.get_pin("D").by(), 0)
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# This is a poly-to-poly of a flipped cell
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self.top_bottom_space = max(0.5*self.m1_width + self.m1_space + extra_contact_space,
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self.poly_extend_active, self.poly_space)
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self.poly_extend_active + self.poly_space)
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total_height = tx_height + min_channel + 2 * self.top_bottom_space
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debug.check(self.height > total_height,
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"Cell height {0} too small for simple min height {1}.".format(self.height,
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total_height))
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@ -148,14 +149,15 @@ class pinv(pgate.pgate):
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def setup_layout_constants(self):
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"""
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Pre-compute some handy layout parameters.
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Compute the width and height
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"""
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# the well width is determined the multi-finger PMOS device width plus
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# the well contact width and half well enclosure on both sides
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self.well_width = self.pmos.active_width + self.pmos.active_contact.width \
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+ self.active_space + 2*self.nwell_enclose_active
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self.width = self.well_width
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# the width is determined the multi-finger PMOS device width plus
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# the well contact width, spacing between them
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self.width = self.pmos.active_offset.x + self.pmos.active_width \
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+ contact.nwell_contact.width + self.active_space + 0.5 * self.nwell_enclose_active
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# This includes full enclosures on each end
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self.well_width = self.width + 2*self.nwell_enclose_active
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# Height is an input parameter, so it is not recomputed.
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def add_ptx(self):
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@ -98,11 +98,11 @@ class pnand2(pgate.pgate):
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# Two PMOS devices and a well contact. Separation between each.
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# Enclosure space on the sides.
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self.well_width = 2 * self.pmos.active_width + contact.active_contact.width \
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self.width = 2 * self.pmos.active_width + contact.active_contact.width \
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+ 2 * self.active_space \
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+ 2 * self.nwell_enclose_active
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+ 0.5 * self.nwell_enclose_active
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self.width = self.well_width
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self.well_width = self.width + 2 * self.nwell_enclose_active
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# Height is an input parameter, so it is not recomputed.
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# This is the extra space needed to ensure DRC rules
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@ -91,10 +91,10 @@ class pnand3(pgate.pgate):
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# Two PMOS devices and a well contact. Separation between each.
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# Enclosure space on the sides.
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self.well_width = 3 * self.pmos.active_width + self.pmos.active_contact.width \
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+ 2 * self.active_space + 2 * self.nwell_enclose_active \
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self.width = 3 * self.pmos.active_width + self.pmos.active_contact.width \
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+ 2 * self.active_space + 0.5 * self.nwell_enclose_active \
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- self.overlap_offset.x
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self.width = self.well_width
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self.well_width = self.width + 2 * self.nwell_enclose_active
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# Height is an input parameter, so it is not recomputed.
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# This is the extra space needed to ensure DRC rules
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@ -245,10 +245,10 @@ class pnand3(pgate.pgate):
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offset=nmos3_pin.center())
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# PMOS3 and NMOS3 are drain aligned
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self.add_path("m2", [pmos3_pin.bc(), nmos3_pin.uc()])
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self.add_path("m2", [pmos3_pin.center(), nmos3_pin.uc()])
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# Route in the A input track (top track)
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mid_offset = vector(nmos3_pin.center().x, self.inputA_yoffset)
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self.add_path("m2", [pmos1_pin.bc(), mid_offset, nmos3_pin.uc()])
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self.add_path("m2", [pmos1_pin.center(), mid_offset, nmos3_pin.uc()])
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# This extends the output to the edge of the cell
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self.add_via_center(layers=self.m1_stack,
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@ -95,11 +95,11 @@ class pnor2(pgate.pgate):
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# Two PMOS devices and a well contact. Separation between each.
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# Enclosure space on the sides.
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self.well_width = 2 * self.pmos.active_width \
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self.width = 2 * self.pmos.active_width \
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+ self.pmos.active_contact.width \
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+ 2 * self.active_space \
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+ 2 * self.nwell_enclose_active
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self.width = self.well_width
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+ 0.5 * self.nwell_enclose_active
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self.well_width = self.width + 2 * self.nwell_enclose_active
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# Height is an input parameter, so it is not recomputed.
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# This is the extra space needed to ensure DRC rules
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@ -225,7 +225,7 @@ class pnor2(pgate.pgate):
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# PMOS1 to mid-drain to NMOS2 drain
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self.add_path("m2",
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[pmos_pin.bc(), mid2_offset, mid3_offset])
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[pmos_pin.center(), mid2_offset, mid3_offset])
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self.add_path("m2",
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[nmos_pin.rc(), mid1_offset, mid2_offset])
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# This extends the output to the edge of the cell
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