From 20a04fccddacfb6701a531013326dd79972e4ad4 Mon Sep 17 00:00:00 2001
From: dwarning <dwarning>
Date: Tue, 30 Apr 2024 16:32:52 +0200
Subject: [PATCH] diode: add model parameter xw for mask and etching effect
 (level=3)

---
 src/spicelib/devices/dio/dio.c      | 1 +
 src/spicelib/devices/dio/diodefs.h  | 3 +++
 src/spicelib/devices/dio/diomask.c  | 3 +++
 src/spicelib/devices/dio/diompar.c  | 4 ++++
 src/spicelib/devices/dio/diosetup.c | 7 +++++--
 5 files changed, 16 insertions(+), 2 deletions(-)

diff --git a/src/spicelib/devices/dio/dio.c b/src/spicelib/devices/dio/dio.c
index b26ec58fe..03a8a656a 100644
--- a/src/spicelib/devices/dio/dio.c
+++ b/src/spicelib/devices/dio/dio.c
@@ -133,6 +133,7 @@ IFparm DIOmPTable[] = { /* model parameters */
  IOP( "xoi", DIO_MOD_XOI, IF_REAL, "Thickness of the polysilicon to bulk oxide (level=3)"),
  IOP( "xm",  DIO_MOD_XM,  IF_REAL, "Masking and etching effects in metal (level=3)"),
  IOP( "xp",  DIO_MOD_XP,  IF_REAL, "Masking and etching effects in polysilicon (level=3)"),
+ IOP( "xw",  DIO_MOD_XW,  IF_REAL, "Masking and etching effects (level=3)"),
 
  IP( "d",    DIO_MOD_D,   IF_FLAG, "Diode model")
 };
diff --git a/src/spicelib/devices/dio/diodefs.h b/src/spicelib/devices/dio/diodefs.h
index bb0e102dc..5fc3c2cf9 100644
--- a/src/spicelib/devices/dio/diodefs.h
+++ b/src/spicelib/devices/dio/diodefs.h
@@ -302,6 +302,7 @@ typedef struct sDIOmodel {       /* model structure for a diode */
     unsigned DIOpolyOxideThickGiven : 1;  /* Thickness of the polysilicon to bulk oxide (level=3) */
     unsigned DIOmetalMaskOffsetGiven : 1; /* Masking and etching effects in metal (level=3)") */
     unsigned DIOpolyMaskOffsetGiven : 1;  /* Masking and etching effects in polysilicon (level=3) */
+    unsigned DIOmaskOffsetGiven : 1;      /* Masking and etching effects (level=3) */
 
     int    DIOlevel;   /* level selector */
     double DIOsatCur;   /* saturation current */
@@ -372,6 +373,7 @@ typedef struct sDIOmodel {       /* model structure for a diode */
     double DIOpolyOxideThick;  /* Thickness of the polysilicon to bulk oxide (level=3) */
     double DIOmetalMaskOffset; /* Masking and etching effects in metal (level=3)") */
     double DIOpolyMaskOffset;  /* Masking and etching effects in polysilicon (level=3) */
+    double DIOmaskOffset;      /* Masking and etching effects (level=3) */
 
 } DIOmodel;
 
@@ -474,6 +476,7 @@ enum {
     DIO_MOD_XOI,
     DIO_MOD_XM,
     DIO_MOD_XP,
+    DIO_MOD_XW,
 };
 
 void DIOtempUpdate(DIOmodel *inModel, DIOinstance *here, double Temp, CKTcircuit *ckt);
diff --git a/src/spicelib/devices/dio/diomask.c b/src/spicelib/devices/dio/diomask.c
index cb9da53f8..a62a63a9e 100644
--- a/src/spicelib/devices/dio/diomask.c
+++ b/src/spicelib/devices/dio/diomask.c
@@ -218,6 +218,9 @@ DIOmAsk (CKTcircuit *ckt, GENmodel *inModel, int which, IFvalue *value)
         case DIO_MOD_XP:
             value->rValue = model->DIOpolyMaskOffset;
             return(OK);
+        case DIO_MOD_XW:
+            value->rValue = model->DIOmaskOffset;
+            return(OK);
 
         default:
             return(E_BADPARM);
diff --git a/src/spicelib/devices/dio/diompar.c b/src/spicelib/devices/dio/diompar.c
index b24aa10d3..3ea68c356 100644
--- a/src/spicelib/devices/dio/diompar.c
+++ b/src/spicelib/devices/dio/diompar.c
@@ -270,6 +270,10 @@ DIOmParam(int param, IFvalue *value, GENmodel *inModel)
             model->DIOpolyMaskOffset = value->rValue;
             model->DIOpolyMaskOffsetGiven = TRUE;
             break;
+        case DIO_MOD_XW:
+            model->DIOmaskOffset = value->rValue;
+            model->DIOmaskOffsetGiven = TRUE;
+            break;
 
         case DIO_MOD_D:
             /* no action - we already know we are a diode, but this */
diff --git a/src/spicelib/devices/dio/diosetup.c b/src/spicelib/devices/dio/diosetup.c
index 2c549e03d..86c4aea2b 100644
--- a/src/spicelib/devices/dio/diosetup.c
+++ b/src/spicelib/devices/dio/diosetup.c
@@ -243,6 +243,9 @@ DIOsetup(SMPmatrix *matrix, GENmodel *inModel, CKTcircuit *ckt, int *states)
         if(!model->DIOpolyMaskOffsetGiven) {
             model->DIOpolyMaskOffset = 0.0;
         }
+        if(!model->DIOmaskOffsetGiven) {
+            model->DIOmaskOffset = 0.0;
+        }
 
         /* loop through all the instances of the model */
         for (here = DIOinstances(model); here != NULL ;
@@ -273,8 +276,8 @@ DIOsetup(SMPmatrix *matrix, GENmodel *inModel, CKTcircuit *ckt, int *states)
             if (model->DIOlevel == 3) {
                 double wm, lm, wp, lp;
                 if((here->DIOwGiven) && (here->DIOlGiven))  {
-                    here->DIOarea = here->DIOw * here->DIOl * here->DIOm;
-                    here->DIOpj = (2 * here->DIOw + 2 * here->DIOl) * here->DIOm;
+                    here->DIOarea = (here->DIOw+model->DIOmaskOffset) * (here->DIOl+model->DIOmaskOffset) * here->DIOm;
+                    here->DIOpj = (2 * (here->DIOw+model->DIOmaskOffset) + 2 * (here->DIOl+model->DIOmaskOffset)) * here->DIOm;
                 }
                 here->DIOarea = here->DIOarea * scale * scale;
                 here->DIOpj = here->DIOpj * scale;